Поступления иностранных книг в библиотеки ННЦ в 2003 г.
Институт физики полупроводников |  |
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Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II: Proc. of the Intern. symp., May 3-6, 1999, Seattle / Eds.: Andricacos P. C. et al.. - Pennington: Electrochem. soc., 1999. - IX,400 p.: ill. - (Proc. vol/ Electrochem. soc. Electronics a. dielectric science a. technology div.; 99-9). - ISBN 1-56677-231-1 - Электрохимическая обработка при производстве БИС и осаждение металла на межсоединения.
Оглавление
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- Developments in the rapidly evolving chip-interconnect technology, where electrochemical processes play a significant role, are discussed. The convergence of academic research in this and other areas of metal/semiconductor deposition with technology requirements, as posed by the electronics and other industries, is a requirement for the continued success of electrochemical processes and is a focal point of this volume.
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